发明名称 |
AZOBENZENE MOLECULAR MATERIALS CONTAINING SPIROBIFLUORENE AND MANUFACTURING THEREOF |
摘要 |
Azobenzene molecular materials are provided to show a consistent photophysical mass transfer behavior and form rapid optical recording and surface relief gratings because a ratio of azobenzene functional groups contained per a single molecule is high. The azobenzene molecular material containing spirobifluorene has a structure represented by a formula (1) and is prepared by reacting the compound of a formula (11) with amines. In the formula (11), Q represents any one halogen atom selected from Br, Cl, I, and F. A method for forming surface relief gratings in film consists of exposing film to a light, wherein the film is formed of the azobenzene molecular material containing spirobifluorene.
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申请公布号 |
KR100727651(B1) |
申请公布日期 |
2007.06.05 |
申请号 |
KR20060055582 |
申请日期 |
2006.06.20 |
申请人 |
GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, DONG YU;CHUN, CHAE MIN;VAK, DOO JIN |
分类号 |
C07C245/08;C07C245/10 |
主分类号 |
C07C245/08 |
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