发明名称 AZOBENZENE MOLECULAR MATERIALS CONTAINING SPIROBIFLUORENE AND MANUFACTURING THEREOF
摘要 Azobenzene molecular materials are provided to show a consistent photophysical mass transfer behavior and form rapid optical recording and surface relief gratings because a ratio of azobenzene functional groups contained per a single molecule is high. The azobenzene molecular material containing spirobifluorene has a structure represented by a formula (1) and is prepared by reacting the compound of a formula (11) with amines. In the formula (11), Q represents any one halogen atom selected from Br, Cl, I, and F. A method for forming surface relief gratings in film consists of exposing film to a light, wherein the film is formed of the azobenzene molecular material containing spirobifluorene.
申请公布号 KR100727651(B1) 申请公布日期 2007.06.05
申请号 KR20060055582 申请日期 2006.06.20
申请人 GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, DONG YU;CHUN, CHAE MIN;VAK, DOO JIN
分类号 C07C245/08;C07C245/10 主分类号 C07C245/08
代理机构 代理人
主权项
地址