发明名称 Method of improving via filling uniformity in isolated and dense via-pattern regions
摘要 An isotropic-diffusion filling method uses a thermal process on a result structure comprising a photoresist layer and an organic material layer to create a cross-linking layer there between, which minimizes step height differences between isolated and dense via-pattern regions for optimizing a subsequent trench process and simplifying process steps.
申请公布号 US7226873(B2) 申请公布日期 2007.06.05
申请号 US20040992668 申请日期 2004.11.22
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 YEN YUNG-SUNG;CHEN KUEI-SHUN;LIN CHIA-HSIANG;LIN LAWRENCE;LIN TSUNG HSIEN
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
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