| 发明名称 |
RESIST COMPOSITION FOR EUV AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
<p>A resist composition for EUV, characterized by comprising: a protected compound (A1) which is a polyhydric phenol compound (a) represented by the following general formula (I) in which part or all of the phenolic hydroxy groups have been protected by an acid-dissociable dissolution-inhibitive group; and an acid generator ingredient (B) which generates an acid upon exposure to light.</p> |
| 申请公布号 |
KR20070057211(A) |
申请公布日期 |
2007.06.04 |
| 申请号 |
KR20077007019 |
申请日期 |
2007.03.28 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HADA HIDEO;HIRAYAMA TAKU;SHIONO DAIJU;WATANABE TAKEO;KINOSHITA HIROO |
| 分类号 |
C07C39/15;C07C39/17;G03F7/032;H01L21/027 |
主分类号 |
C07C39/15 |
| 代理机构 |
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| 主权项 |
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