发明名称 |
REVERSE FLOW PREVENTING AND VACUUM MAINTAINING SYSTEM FOR SEMICONDUCTOR EQUIPMENT |
摘要 |
A reverse flow preventing and vacuum maintaining apparatus of semiconductor manufacturing equipment is provided to prevent contamination of a chamber from a reverse flow effect caused by an abnormal state of a vacuum pump due to electric failure or overload. A plurality of vacuum pumps(20) are used for pumping a plurality of chambers(10). A vacuum line(30) is used for connecting each of the chambers with each of the vacuum pumps. An isolation valve(40) is installed at a connecting part between the chamber and the vacuum line. A reverse flow preventing valve(500) is installed at a connecting part between the vacuum pump and the vacuum line. A vacuum connecting line(600) is used for connecting the vacuum line with the vacuum line. A vacuum maintaining valve(700) is installed at the vacuum connecting line.
|
申请公布号 |
KR20070056717(A) |
申请公布日期 |
2007.06.04 |
申请号 |
KR20050115717 |
申请日期 |
2005.11.30 |
申请人 |
DONGBU ELECTRONICS CO., LTD. |
发明人 |
CHOI, IL KYU |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|