发明名称 REVERSE FLOW PREVENTING AND VACUUM MAINTAINING SYSTEM FOR SEMICONDUCTOR EQUIPMENT
摘要 A reverse flow preventing and vacuum maintaining apparatus of semiconductor manufacturing equipment is provided to prevent contamination of a chamber from a reverse flow effect caused by an abnormal state of a vacuum pump due to electric failure or overload. A plurality of vacuum pumps(20) are used for pumping a plurality of chambers(10). A vacuum line(30) is used for connecting each of the chambers with each of the vacuum pumps. An isolation valve(40) is installed at a connecting part between the chamber and the vacuum line. A reverse flow preventing valve(500) is installed at a connecting part between the vacuum pump and the vacuum line. A vacuum connecting line(600) is used for connecting the vacuum line with the vacuum line. A vacuum maintaining valve(700) is installed at the vacuum connecting line.
申请公布号 KR20070056717(A) 申请公布日期 2007.06.04
申请号 KR20050115717 申请日期 2005.11.30
申请人 DONGBU ELECTRONICS CO., LTD. 发明人 CHOI, IL KYU
分类号 H01L21/02 主分类号 H01L21/02
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