发明名称 VACUUM CONTROL SYSTEM FOR DUAL CHAMBER IN SEMICONDUCTOR EQUIPMENT
摘要 A vacuum control device of a dual chamber in semiconductor equipment is provided to connect easily two load lock chambers and a dry pump by using a three-way valve. An entrance load lock chamber provides a standby space to a wafer to be transferred into a process chamber. An exit load lock chamber outputs the wafer processed by the process chamber. A dry pump is connected to the entrance load lock chamber and the exit load lock chamber by using vacuum lines. A three-way valve(100) is connected to the connecting lines of the entrance load lock chamber, the exit load lock chamber, and the dry pump. The three-way valve includes a valve operating part(110), a valve body part(120), and a valve driving part(130).
申请公布号 KR20070056720(A) 申请公布日期 2007.06.04
申请号 KR20050115728 申请日期 2005.11.30
申请人 DONGBU ELECTRONICS CO., LTD. 发明人 CHOI, IL KYU
分类号 H01L21/02 主分类号 H01L21/02
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