A HIGH-FREQUENCY PLASMA PROCESS WHEREIN THE PLASMA IS EXCITED BY AN INDUCTIVE STRUCTURE IN WHICH THE PHASE AND ANTI-PHASE PORTIONS OF THE CAPACITIVE CURRENTS BETWEEN THE INDUCTIVE STRUCTURE AND THE PLASMA ARE BALANCED,申请号KR19980704184-传众专利搜索

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发明名称	A HIGH-FREQUENCY PLASMA PROCESS WHEREIN THE PLASMA IS EXCITED BY AN INDUCTIVE STRUCTURE IN WHICH THE PHASE AND ANTI-PHASE PORTIONS OF THE CAPACITIVE CURRENTS BETWEEN THE INDUCTIVE STRUCTURE AND THE PLASMA ARE BALANCED
摘要
申请公布号	KR100663874(B1)	申请公布日期	2007.06.04
申请号	KR19980704184	申请日期	1998.06.03
申请人		发明人
分类号	H05H1/46	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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