| 摘要 |
A plasma processing apparatus capable of processing substrates in parallel batch is provided to increase the throughput of the substrates by sharing two batch processing chambers with one plasma reactor. A first batch processing chamber(10) receives plural substrates(W1), and second batch processing chamber(20) receives plural another substrates(W2). At least two external discharge pipes(30,40) are connected to the first and second batch processing chambers to form a plasma discharge path. Ferrite cores(31,41) are connected to an induction coil to induce the plasma discharge path. The first and second bath processing chambers have cylindrical bodies(11,21). The external discharge pipe has a first external discharge pipe for connecting upper portions of the processing chambers and a second external discharge pipe for connecting lower portions of processing chambers.
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