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发明名称
制备薄氮化锆涂层之方法
摘要
叙述一种产生氮化锆涂层的制程,是藉着反应性气体在基材表面的CVD(化学蒸气沉积)方法;ZrN涂层及其用途。在该制程中,肆(二烷基醯胺)锆具有通式为:Zr(NR1R2)4其中使用R1及R2代表相同或不同之直链或有分支的C1至C4烷基基团为Zr的前趋物,并且联氨具有通式:H2N-NR3R4其中使用R3代表直链或有分支的C1至C4烷基基团、及R4独立代表C1至C4烷基基团或H作为反应性气体。
申请公布号
TW200720469
申请公布日期
2007.06.01
申请号
TW095126127
申请日期
2006.07.18
申请人
史达克有限公司
发明人
陆可侬;潘爵德;金洋素;潘哈许;弗罗兰
分类号
C23C16/34(2006.01)
主分类号
C23C16/34(2006.01)
代理机构
代理人
蔡中曾;黄庆源
主权项
地址
德国
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