| 摘要 |
A deposition source spraying apparatus which is excellent in uniformity and reproducibility of a deposition film of an organic material, a metal and the like, and improves yield of a deposition source is provided. In a deposition source spraying apparatus(1) for forming a deposition film on a substrate, the deposition source spraying apparatus comprises: at least one crucible(10) for containing a deposition source and heating the deposition source; at least one partition part(31) in which a plurality of shields(32) are formed to distribute a deposition source supplied from the crucible through at least one distribution pipe(40a,40b); a spray head(50) which is connected to the distribution pipe and includes a plurality of nozzles(52) for spraying the deposition source flown in the spray head; and a straight reciprocating mechanism for scanning the spray head. The crucible includes a body(11) for containing the deposition source, a heater(12) for heating the deposition source, a projection part(15) projected from an inner part of the body, and a plurality of shields(16) extending from the projection part. The spray head has a shower head(51) for supplying the deposition source to the respective nozzles.
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