发明名称 |
HIGH STABILITY AND HIGH CAPACITY PRECURSOR VAPOR GENERATION FOR THIN FILM DEPOSITION |
摘要 |
<p>An apparatus for vaporizing a liquid for subsequent thin film deposition on a substrate. The apparatus comprises a housing with an inlet and an outlet and a liquid reservoir. A mechanism controls the liquid level in the reservoir to a substantially constant level. A gas flow passageway extends along side a porous metal wall with interstitial spaces for containing liquid from the reservoir and with a package for a carrier gas to flow along side the porous metal wall, forming a gas/vapor mixture suitable for thin film deposition.</p> |
申请公布号 |
WO2007062242(A2) |
申请公布日期 |
2007.05.31 |
申请号 |
WO2006US45512 |
申请日期 |
2006.11.28 |
申请人 |
MSP CORPORATION;LIU, BENJAMIN, Y.H. |
发明人 |
LIU, BENJAMIN, Y.H. |
分类号 |
B01D47/00;C23C16/00;F22B23/00 |
主分类号 |
B01D47/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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