发明名称 HIGH STABILITY AND HIGH CAPACITY PRECURSOR VAPOR GENERATION FOR THIN FILM DEPOSITION
摘要 <p>An apparatus for vaporizing a liquid for subsequent thin film deposition on a substrate. The apparatus comprises a housing with an inlet and an outlet and a liquid reservoir. A mechanism controls the liquid level in the reservoir to a substantially constant level. A gas flow passageway extends along side a porous metal wall with interstitial spaces for containing liquid from the reservoir and with a package for a carrier gas to flow along side the porous metal wall, forming a gas/vapor mixture suitable for thin film deposition.</p>
申请公布号 WO2007062242(A2) 申请公布日期 2007.05.31
申请号 WO2006US45512 申请日期 2006.11.28
申请人 MSP CORPORATION;LIU, BENJAMIN, Y.H. 发明人 LIU, BENJAMIN, Y.H.
分类号 B01D47/00;C23C16/00;F22B23/00 主分类号 B01D47/00
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