| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base material for a resist material which responses radiations such as excimer laser light of KrF etc., extreme ultraviolet rays (EUV), electron beam, and X-rays and a radiation-sensitive composition containing the base material; and to provide a solvent-soluble non-macromolecular radiation-sensitive composition which is produced by a simple process without using a metal catalyst and is high in sensitivity, resolution, heat resistance, and etching resistance. <P>SOLUTION: The base material for a resist material contains a polyphenolic organic compound having a specified structure. The radiation-sensitive composition contains the base material and an acid generator. <P>COPYRIGHT: (C)2007,JPO&INPIT |
