发明名称 |
RESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS |
摘要 |
<p>In the lithographic multilayer resist process, a material comprising a copolymer of a hydroxy-containing vinylnaphthalene with hydroxy-free olefins is useful in forming a resist undercoat. The undercoat-forming material has a high transparency and optimum values of n and k so that it functions as an antireflective coating during short-wavelength exposure, and has etching resistance during substrate processing by etching.</p> |
申请公布号 |
KR20070055972(A) |
申请公布日期 |
2007.05.31 |
申请号 |
KR20060117681 |
申请日期 |
2006.11.27 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;FUJII TOSHIHIKO |
分类号 |
G03F7/09;G03F7/004 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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