Processing liquid coating apparatus and a processing liquid coating method

摘要

The present invention relates to a processing liquid coating apparatus and a processing liquid coating method suitable for use in a lithography process for forming fine circuit patterns on a surface of a substrate such as a semiconductor wafer. The processing liquid coating apparatus according to the present invention includes a substrate holder ( 1 ) for holing and rotating a substrate (W), and a processing liquid supply unit ( 2 ) disposed apart from the substrate (w) held by the substrate holder ( 1 ). The processing liquid supply unit ( 2 ) has a plurality of supply ports ( 5, 6 ) for supplying a processing liquid to a plurality of portions including a central portion (C) of a surface of the substrate (W). A resist liquid or a developer is used as the processing liquid.