发明名称 Multi-bit memory element and production process has U-shaped trench structure with conductive region and insulating region containing at least two floating gates
摘要 <p>A multi-bit memory element comprise a trench structure comprising an electrically conductive region (102) on which is an insulating region (103) in or on which are at least two floating gate regions (104a,104b) that are electrically isolated from one another and from the electrically conductive region. Preferably the trench is U-shaped with a curved base region and the insulating region comprises many insulating parts (103a,103b). An independent claim is also included for a production process for the above.</p>
申请公布号 DE102005055302(A1) 申请公布日期 2007.05.31
申请号 DE20051055302 申请日期 2005.11.21
申请人 INFINEON TECHNOLOGIES AG 发明人 LAU, FRANK
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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