| 摘要 |
PURPOSE:To obtain the titled material capable of giving a resist image having a high resolution and giving a resist pattern having an improved through put without making a manufacturing step to complexity by providing a photodecoloring layer composed of a photodecoloring coloring matter and a binder made of a prescribed organic polymer soluble to an organic solvent and an alkaline solution on the photoresist layer. CONSTITUTION:The photodecoloring layer composed of the photodecoloring coloring matter and the binder made of the prescribed organic polymer soluble to the organic solvent and the alkaline solution is provided on the photoresist layer. The prescribed binder is a homopolymer or a copolymer contg. at least one of the repeating units shown by formulas I-IV wherein R<1> and R<2> are each a hydrogen, a halogen atom, a lower alkyl or a lower aryl group, R<3> is hydrogen atom or an lower alkyl group, R<4> is a hydrogen atom or 1-18C an alkyl group, R<5> is 2-3C a trivalent group, A is a single bond or a bivalent group, B is an imino or an oxy group, X is a carboxylic, a sulfonic or a sulfenic acid group, etc., Y is a prescribed group. The content of the photodecoloring coloring matter is 5-100wt% on the weight basis of the binder. The thickness of the photodecoloring layer is 0.1-2mum. |
