发明名称 PLASMA SURFACE TREATMENT DEVICE AND MANUFACTURING METHOD OF SURFACE TREATMENT CYLINDER BASE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a device capable of excellent plasma treatment more uniformly in a plasma surface treatment of a cylindrical base material, and a manufacturing method of a surface treatment cylindrical base material. <P>SOLUTION: The coaxial type plasma surface treatment device has an electrode 1 arranged at outside of a coaxially arranged cylindrical base material 3, and an inside electrode 2 arranged so as to be opposed to the outside electrode 1 through the cylindrical base material 3. A groove, in which gas can flow in axial direction, is formed on the plasma surface treatment side electrode. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007134056(A) 申请公布日期 2007.05.31
申请号 JP20050323139 申请日期 2005.11.08
申请人 MITSUI CHEMICALS INC 发明人 ODAKAWA KENJI;SADAMOTO MITSURU
分类号 H05H1/24;B01J19/08;C08J7/00;C23C16/455 主分类号 H05H1/24
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