发明名称 |
DEPOSITION OF RUTHENIUM OXIDE COATINGS ON A SUBSTRATE |
摘要 |
<p>A CVD process is defined for producing a ruthenium dioxide or ruthenium metal like coating on an article. The article is preferably for use as an architectural glazing, and preferably has low emissivity and solar control properties. The method includes providing a heated glass substrate having a surface on which the coating is to be deposited. A ruthenium containing precursor, an oxygen containing compound, and optionally water vapor, in conjunction with an inert carrier gas, are directed toward and along the surface to be coated and the ruthenium containing precursor and the oxygen containing compound are reacted at or near the surface of the glass substrate to form a ruthenium dioxide coating.</p> |
申请公布号 |
WO2007061980(A1) |
申请公布日期 |
2007.05.31 |
申请号 |
WO2006US44955 |
申请日期 |
2006.11.21 |
申请人 |
YE, LIANG;REMINGTON, MICHAEL, P., JR. |
发明人 |
REMINGTON, MICHAEL, P., JR. |
分类号 |
C03C17/245;C23C16/40 |
主分类号 |
C03C17/245 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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