发明名称 CHEMICAL VAPOR DEPOSITION OF HYDROGEL FILMS
摘要 In one embodiment of the invention, iCVD is used to form non-crosslinked thin films using a radical initiator and an alkene. In another embodiment, iCVD is used to form crosslinked thin films by the addition of a crosslinking agent (e.g., a diacrylate or a dimethyacrylate). In one embodiment, when the crosslinker is EDGA and the monomer is HEMA it results in crosslinked P(HEMA-co-EGDA) copolymer, m another embodiment, when the crosslinker is EDGA and the monomer is VP, it results in crosslinked P(VP-co- EGDA). Disclosed are the effects of crosslinker incorporation on the thermal and the wetting properties of the polymers. The unique swelling properties of these films are also described; certain films of the present invention are hydro gels when soaked in water.
申请公布号 WO2007019495(A3) 申请公布日期 2007.05.31
申请号 WO2006US30873 申请日期 2006.08.07
申请人 MASSACHUSETTS INSTITUTE OF TECHNOLOGY;GLEASON, KAREN, K.;CHAN, KEVIN 发明人 GLEASON, KAREN, K.;CHAN, KEVIN
分类号 C09D4/00;B05D7/24;C23C16/00 主分类号 C09D4/00
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