发明名称 SOLID STATE IMAGING DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress the degradation of the characteristics of a peripheral circuit in a CMOS image sensor using an N/P<SP>+</SP>substrate. SOLUTION: A deep p-well 13' is formed, e.g. in an n-type epitaxial layer 23 corresponding to a peripheral circuit analog region 13 wherein an analog peripheral circuit is formed. This p-well 13' is connected to a p-type semiconductor substrate 22 via a p-well 25 in order to be at the stable zero potential. Similarly, a deep p-well 14' is formed in the n-type epitaxial layer 23 corresponding to a peripheral circuit logic region 14 wherein a logic peripheral circuit is formed. This p-well 14' is connected to the p-type semiconductor substrate 22 via the p-well 25 in order to be at the stable zero potential. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007134581(A) 申请公布日期 2007.05.31
申请号 JP20050327601 申请日期 2005.11.11
申请人 TOSHIBA CORP 发明人 INOUE IKUKO;YAMASHITA HIROSHI;IHARA HISANORI;YAMAGUCHI TETSUYA;TANAKA NAGATAKA;GOTO HIROSHIGE
分类号 H01L27/146 主分类号 H01L27/146
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