发明名称 SEMICONDUCTOR WAFER INCLUDING SEMICONDUCTOR CHIPS DIVIDED BY SCRIBE LINE AND PROCESS-MONITOR ELECTRODE PADS FORMED ON SCRIBE LINE
摘要 <p>The present invention discloses a semiconductor wafer having a scribe line dividing the semiconductor wafer into a matrix of plural semiconductor chips. The semiconductor wafer includes a polysilicon layer, a poly-metal interlayer insulation film formed on the polysilicon layer, and a first metal wiring layer formed on the poly-metal interlayer insulation film. The semiconductor wafer includes a process-monitor electrode pad formed on a dicing area of the scribe line. The process-monitor electrode pad has a width greater than the width of the dicing area. The process-monitor electrode pad includes a contact hole formed in the poly-metal insulation film for connecting the first metal wiring layer to the polysilicon layer.</p>
申请公布号 WO2007061124(A1) 申请公布日期 2007.05.31
申请号 WO2006JP323872 申请日期 2006.11.22
申请人 RICOH COMPANY, LTD.;YOSHIDA, MASAAKI;KOUNO, SATOSHI 发明人 YOSHIDA, MASAAKI;KOUNO, SATOSHI
分类号 H01L21/66;B22D17/20;H01L21/3205;H01L21/822;H01L23/52;H01L27/04 主分类号 H01L21/66
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