发明名称 APPARATUS AND METHOD FOR WET-CHEMICAL PROCESSING OF FLAT, THIN SUBSTRATES IN A CONTINUOUS METHOD
摘要 <p>The invention relates to a method and apparatus for wet-chemical processes (cleaning, etching, stripping, cutting, dehydration) in a continuous method for flat, thin and fracture-sensitive substrates, the substrate transport an d the wet process being effected by media-absorbing rollers.</p>
申请公布号 CA2630885(A1) 申请公布日期 2007.05.31
申请号 CA20062630885 申请日期 2006.11.22
申请人 ACP-ADVANCED CLEAN PRODUCTION GMBH 发明人 KUNZE-CONCEWITZ, HORST
分类号 H01L21/00;B08B1/02;B08B1/04;B08B3/04 主分类号 H01L21/00
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