| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device that can inspect an exposure machine and reduce an inspection time even when the positional relation between a photosensor and a micromirror is a little misaligned or the optical axis is a little misaligned. <P>SOLUTION: The exposure machine comprises a light source that emits parallel luminous fluxes, a DMD (digital micromirror device) having a large number of micromirrors each of which independently can oscillate and reflecting and deflecting the light from the light source by each micromirror, and an optical means irradiating an exposure object with the light reflected and deflected by the DMD. The exposure machine is characterized in that: the plurality of micromirrors constituting the DMD are individually driven at different frequencies (f1 to fN); changes in the light passing the optical means are detected by a photosensor; an output of the photosensor is obtained by passing filters (F1 to FN) corresponding to the respective frequencies; and the frequency waveforms of drive sources driving the micromirrors are compared to the output waveforms of the respective filters. <P>COPYRIGHT: (C)2007,JPO&INPIT |
