发明名称 |
METHOD OF SCANNING A SUBSTRATE, AND METHOD AND APPARATUS FOR ANALYZING CRYSTAL CHARACTERISTICS |
摘要 |
In an embodiment, a method of scanning a substrate, and a method and an apparatus for analyzing crystal characteristics are disclosed. A sequential scan on the scan areas using a first electron beam and a second electron beam are repeatedly performed. The electrons accumulated in the scan areas by the first electron beam are removed from the scan areas by the second electron beam. When a size of the scan area is substantially the same as a spot size of the first electron beam, adjacent scan areas partially overlap each other. When each of the scan areas is larger than a spot size of the first electron beam, the adjacent scan areas do not overlap each other. Images of the scan areas are generated using back-scattered electrons emitted from each of the scan areas by irradiating the first electron beam to analyze crystal characteristics of circuit patterns on the substrate.
|
申请公布号 |
US2007120054(A1) |
申请公布日期 |
2007.05.31 |
申请号 |
US20060564726 |
申请日期 |
2006.11.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON YOUNG-JEE;LIM JUNG-TAEK;KIM TAE-SUNG;JUN CHUNG-SAM;PARK SUNG-HONG |
分类号 |
G01N23/00 |
主分类号 |
G01N23/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|