ELECTROMAGNETIC RADIATION SOURCE, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY

摘要

PROBLEM TO BE SOLVED: To provide a discharge-generating plasma electromagnetic radiation source preventing occurrence of contamination comparatively easily, in the radiation source suitable for an EUV radiation source.

SOLUTION: A device for generating radiation ray based on a discharge includes a cathode 33k and an anode 33a. The device is provided with a discharge material source for supplying an appropriate substance in a discharge space, and a discharge power source 41 which is so constituted by connecting to the cathode 33k and the anode 33a as to cause discharge in the substance to form plasma to generate electromagnetic radiation ray having spectral characteristics.

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