| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of adequately shielding any one of a plurality of evaporation sources in a vacuum chamber by a shielding means without increasing the volume inside the vacuum chamber. SOLUTION: At least three evaporation sources 4a-4d are provided facing a substrate to be processed, and a shielding means 5 for shielding the evaporation sources is provided to prevent re-deposition of evaporated particles from either evaporation source on other evaporation sources. Each evaporation source is arranged on the same circumference. There are provided one rotary shaft 61 with the center of the circumference being a center of rotation thereof, and hollow rotary shafts 62-66 arranged concentric with the rotary shaft while the number thereof is smaller than the number of the evaporation sources, and the projecting length in the vacuum chamber is reduced from the length of the rotary shaft step by step. The shielding means is connected to the rotary shaft and the hollow rotary shafts, respectively. A driving means 9 for moving the shielding means via the rotary shaft and the hollow rotary shafts is provided between the open position for opening the evaporation sources and the shielding position for shielding the evaporation sources. COPYRIGHT: (C)2007,JPO&INPIT
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