| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress deposition of odorant to a bottom part of a hydrogen tank. <P>SOLUTION: The hydrogen supply device is provided with the hydrogen tank 1 storing hydrogen with odorant mixed into it and agitating means 10 and 11 agitating the odorant and the hydrogen in the hydrogen tank 1. <P>COPYRIGHT: (C)2007,JPO&INPIT |
