| 发明名称 |
NEGATIVE-ACTING AQUEOUS PHOTORESIST COMPOSITION |
| 摘要 |
THE INVENTION RELATES TO A NOVEL NEGATIVE, AQUEOUS PHOTORESIST COMPOSITION COMPRISING A POLYVINYLACETAL POLYMERT, A WATER-SOLUBLE PHOTOACTIVE COMPOUND AND A CROSSLINKING AGENT. THE WATER-SOLUBLE PHOTOACTIVE COMPOUND IS PREFERABLY A SULFONIUM SALT. THE INVENTION ALSO RELATES TO FORMING A NEGATIVE IMAGE FROM THE NOVEL PHOTORESIST COMPOSITION.(FIG 1)
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| 申请公布号 |
MY129900(A) |
申请公布日期 |
2007.05.31 |
| 申请号 |
MY2002PI03590 |
申请日期 |
2002.09.26 |
| 申请人 |
AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
PING-HUNG LU;MARK O. NEISSER;RALPH R. DAMMEL;HENGPENG WU |
| 分类号 |
G03C1/73;G03F7/039;G03F7/004;G03F7/038;G03F7/20;G03F7/30;G03F7/32;H01L21/027 |
主分类号 |
G03C1/73 |
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