发明名称 MULTILAYERED STRUCTURE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a multilayered structure excellent in gas barrier properties under a high humidity condition, and its manufacturing method. SOLUTION: The multilayered structure includes a first layer comprising a first layer comprising a first material containing a first inorganic lamellar compound and a second layer comprising a second material containing an inorganic lamellar compound in a volume ratio higher than that of the inorganic lamellar compound in the first material and is characterized in that the first layer and the second layer are laminated so as to be adjacent to each other. The manufacturing method of the multilayered structure which includes a base material layer, the first layer comprising the first material containing the first inorganic lamellar compound and the second layer comprising the second material containing the inorganic lamellar compound in the volume ratio higher than that of the inorganic lamellar compound in the first material and is characterized in that the first layer and the second layer are laminated so as to be adjacent to each other, is also disclosed. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007130760(A) 申请公布日期 2007.05.31
申请号 JP20050306726 申请日期 2005.10.21
申请人 SUMITOMO CHEMICAL CO LTD 发明人 OSAKI NOBUHIRO;SAKATANI TAIICHI
分类号 B32B9/00 主分类号 B32B9/00
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