发明名称 |
Method and zone for sealing between two microstructure substrates |
摘要 |
The invention concerns a sealing zone between two microstructure substrates. Said sealing zone comprises at least the following parts: on a first wafer level ( 20 ), a lower edging ( 22 A) made of an adhesive material capable of causing the first substrate ( 20 ) to adhere to a sealing material, said sealing material being adapted to spontaneously diffuse jointly with the material of the second wafer level ( 30 ); on said lower edging ( 22 A), a layer of said sealing material; and on said layer of sealing material, a protuberance ( 36 ) formed on said second wafer level ( 30 ) containing a certain amount of sealing material. The invention is applicable to microstructures comprising vacuum-operated components.
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申请公布号 |
US2007122929(A1) |
申请公布日期 |
2007.05.31 |
申请号 |
US20020500196 |
申请日期 |
2002.12.17 |
申请人 |
DIEM BERNARD;CAPLET STEPHANE;DELAYE MARIE-THERESE |
发明人 |
DIEM BERNARD;CAPLET STEPHANE;DELAYE MARIE-THERESE |
分类号 |
B81C3/00;H01L21/00;B81B7/00 |
主分类号 |
B81C3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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