发明名称 Method and zone for sealing between two microstructure substrates
摘要 The invention concerns a sealing zone between two microstructure substrates. Said sealing zone comprises at least the following parts: on a first wafer level ( 20 ), a lower edging ( 22 A) made of an adhesive material capable of causing the first substrate ( 20 ) to adhere to a sealing material, said sealing material being adapted to spontaneously diffuse jointly with the material of the second wafer level ( 30 ); on said lower edging ( 22 A), a layer of said sealing material; and on said layer of sealing material, a protuberance ( 36 ) formed on said second wafer level ( 30 ) containing a certain amount of sealing material. The invention is applicable to microstructures comprising vacuum-operated components.
申请公布号 US2007122929(A1) 申请公布日期 2007.05.31
申请号 US20020500196 申请日期 2002.12.17
申请人 DIEM BERNARD;CAPLET STEPHANE;DELAYE MARIE-THERESE 发明人 DIEM BERNARD;CAPLET STEPHANE;DELAYE MARIE-THERESE
分类号 B81C3/00;H01L21/00;B81B7/00 主分类号 B81C3/00
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