WASHING LIQUID FOR PHOTOLITHOGRAPHY, AND METHOD FOR WASHING EXPOSURE DEVICE USING THE SAME

摘要

[PROBLEMS] To provide a washing liquid for photolithography, which, in a liquid immersion exposure process, can efficiently wash and remove contaminants of an exposure device site (particularly an optical lens part) derived from an elution component from a photoresist, can realize simple waste liquid treatment, can realize high replacement with a liquid immersion medium, and does not cause any problem with throughput in the manufacture of semiconductors, and a method for washing an exposure device using the same. [MEANS FOR SOLVING PROBLEMS] A washing liquid for photolithography for use in washing of an exposure device in a liquid immersion exposure process in which exposure is carried out in such a state that a part between the exposure device in its optical lens part and an object for exposure mounted on a wafer stage is filled with a liquid immersion medium, the washing liquid comprising (a) a surfactant, (b) a hydrocarbon solvent, and (c) water, and a method for washing an exposure device using the washing liquid.