发明名称 MASKING DEVICE FOR MANUFACTURING SEMICONDUCTOR ELEMENT
摘要 <p>PURPOSE:To make it possible to forecast the stability of the supply of products by a method wherein the dimensions or positions of semiconductor element forming patterns are arranged over the whole unit semiconductor slice with an arbitrary variability by a statistical technique. CONSTITUTION:Patterns are included a plurality of pieces and the dimension or position of each pattern is arranged so as to have a random error value within a range specified arbitrarily from the dimension or position of a pattern which is used as a reference. When a trial product is made using such a mask, an irregular sample, which is found only in a very long period in a standard process, can be easily obtained, the stability of the supply of products, which is changed due to the relative variability of each element, not only can be forecast, but also an examination of the reliability of an applied apparatus using the semiconductor element is also facilitated and the reliability of the apparatus can be improved.</p>
申请公布号 JPH01222444(A) 申请公布日期 1989.09.05
申请号 JP19880048067 申请日期 1988.03.01
申请人 MATSUSHITA ELECTRON CORP 发明人 FUJITA YASUHIRO
分类号 G03F1/00;H01L21/027;H01L21/30 主分类号 G03F1/00
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