发明名称 MOS transistor with deformable gate
摘要 <p>A MOS transistor with a deformable gate formed in a semiconductor substrate (10), comprises : (A) some source and drain zones (11, 12) separated by a channel zone (13) extending in a first direction from the source to the drain and in a second direction perpendicular to the first direction; (B) a conducting gate beam (16) placed at least above the channel zone extending in the second direction between some support points placed on the substrate at each side of the channel zone. The surface of the channel zone is hollow and has a form similar to that of the gate beam when it is in maximum deflection towards the channel zone. Independent claims are also included for : (A) a circuit oscillator incorporating this transistor; (B) the fabrication of this transistor with a deformable gate.</p>
申请公布号 EP1637498(B1) 申请公布日期 2007.05.30
申请号 EP20050108509 申请日期 2005.09.15
申请人 ST MICROELECTRONICS S.A.;COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 ANCEY, PASCAL;ABELE, NICOLAS;CASSET, FABRICE
分类号 B81B7/02;B81B3/00;B81C1/00 主分类号 B81B7/02
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