Electrostatic chuck having temperature-detecting device, photolithography equipment having the same, and method of detecting temperature at surfaces of photo masks

摘要

Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.