PHOTOMASKS INCLUDING MULTI LAYERED LIGHT SHIELDING PATTERNS, MANUFACTURING METHOD THEREOF AND BLANK PHOTOMASK FOR FABRICATING THE SAME

摘要

A photomask and a manufacturing method thereof, and a blank photomask are provided to stabilize semiconductor manufacturing processes by reducing the generation of defects and enhancing the resolution using a plurality of light shielding patterns composed of a pair of an opaque layer and a transparent layer. A photomask includes a glass substrate(100) and a plurality of light shielding patterns. The plurality of light shielding patterns(110) are formed on the glass substrate. The light shielding pattern is composed of opaque layers(110a) and transparent layer(110b) alternately stacked with each other. The opaque layer is made of one selected from a group consisting of an organic material containing silicon, Cr, Mo, Al, Ti, Ta, or Ru. The transparent layer is made of oxide silicon.