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发明名称
Method for forming a metal line of semiconductor device using a damascene process
摘要
申请公布号
KR100723465(B1)
申请公布日期
2007.05.30
申请号
KR20000086272
申请日期
2000.12.29
申请人
发明人
分类号
H01L21/28
主分类号
H01L21/28
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代理人
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地址
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