HYDROXY-AMINO THERMALLY CURED UNDERCOAT FOR 193 NM LITHOGRAPHY
摘要
<p>A photolithographic sensitive coated substrate comprising a thermally cured undercoat on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat.</p>
申请公布号
EP1163550(B1)
申请公布日期
2007.05.30
申请号
EP20000916239
申请日期
2000.03.10
申请人
FUJIFILM ELECTRONIC MATERIALS USA, INC.
发明人
FOSTER, PATRICK;SLATER, SIDNEY, GEORGE;STEINHAUSLER, THOMAS;BLAKENEY, ANDREW, J.;BIAFORE, JOHN, JOSEPH
