Method for non-destructive analysis of surface defects of cuprous (copper(I)) oxide

摘要

The invention relates to a method for non-destructive analysis of surface defects of copper(I) oxide. After having oxidised a copper or copper alloy surface, the sample is subjected to monochromatic light radiation whose wavelength corresponds to one of the wavelengths for which the absorption spectrum exhibits a maximum, and the photoluminescent flux emitted is detected and spectrally analysed. The thickness of the oxide layer lies between 10 and 5000 monoatomic oxide layers.