发明名称 |
Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument |
摘要 |
A manufacturing process of an electro-optical apparatus substrate is provided wherein a substrate is coated with a photosensitive resin. A first exposure process is executed with a first reticle to form an uneven portion on the substrate. Subsequently, a second exposure process is executed with a second reticle to remove all the photosensitive resin on portions other than the uneven portion. After the second exposure process, the substrate is developed so as to form an underlying film having an uneven portion.
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申请公布号 |
US7224505(B2) |
申请公布日期 |
2007.05.29 |
申请号 |
US20040980750 |
申请日期 |
2004.11.03 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
OTAKE TOSHIHIRO;KOJIMA TOMOHIKO;KANEKO HIDEKI;UEHARA TOSHINORI;NAKANO TOMOYUKI;TAKIZAWA KEIJI |
分类号 |
G02F1/03;G02F1/1335;G02F1/13;G02F1/133;G02F1/1365;G02F1/29;G03F7/00;G03F7/20;G03F9/00;H01L21/00 |
主分类号 |
G02F1/03 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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