发明名称 |
Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program |
摘要 |
It is determined whether it is necessary to execute processing for automatically measuring a shot compensation parameter. Processing is reduced by performing automatic measurement of the shot compensation parameter only when such measurement is necessary. This is followed by measuring a wafer compensation parameter automatically. Depending upon whether or not automatic measurement of the shot compensation parameter has been performed, it is determined whether to calculate a relative parameter delta between the shot compensation parameter and wafer compensation parameter or to calculate a shot compensation parameter from a stored relative parameter delta and a wafer compensation parameter. This maintains alignment precision. The units comprising the apparatus are driven to perform exposure in accordance with the shot compensation parameter and wafer compensation parameter obtained.
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申请公布号 |
US7224459(B2) |
申请公布日期 |
2007.05.29 |
申请号 |
US20020234378 |
申请日期 |
2002.09.05 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MORIMOTO OSAMU |
分类号 |
G01B11/00;G01B21/00;G03B27/00;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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