发明名称 |
Method of forming a dual damascene metal trace with reduced RF impedance resulting from the skin effect |
摘要 |
The RF impedance of a metal trace at gigahertz frequencies is reduced by forming the metal trace to have a base region and a number of fingers that extend away from the base region. When formed to have a number of loops, the metal trace forms an inductor with an increased Q.
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申请公布号 |
US7223680(B1) |
申请公布日期 |
2007.05.29 |
申请号 |
US20030727451 |
申请日期 |
2003.12.03 |
申请人 |
NATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
HOPPER PETER J.;JOHNSON PETER;HWANG KYUWOON;MIAN MICHAEL;DRURY ROBERT |
分类号 |
H01L21/44;H01L21/768;H01L23/28;H01L23/48;H01L23/522;H01L23/528;H01L29/40 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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