发明名称 |
Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus |
摘要 |
During scanned exposure of target portions at the edge of the substrate, the position of an edge of the illumination field is changed so as to prevent or reduce radiation falling onto the substrate table or to expose an L-shaped area. In this way the heat load on the substrate table can be reduced and dummy structures can fill a mouse bite without overlapping an alignment mark.
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申请公布号 |
US7224438(B2) |
申请公布日期 |
2007.05.29 |
申请号 |
US20030738980 |
申请日期 |
2003.12.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OTTENS JOOST JEROEN;VAN KERVINCK MARCEL NICOLAAS JACOBUS |
分类号 |
G03B27/54;G03F7/22;G03B27/42;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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