| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.</p> |
| 申请公布号 |
KR20070054585(A) |
申请公布日期 |
2007.05.29 |
| 申请号 |
KR20060116526 |
申请日期 |
2006.11.23 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JANSEN HANS;CORNELISSEN SEBASTIAAN MARIA JOHANNES;DONDERS SJOERD NICOLAAS LAMBERTUS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;JACOBS HERNES;LEENDERS MARTINUS HENDRIKUS ANTONIUS;MERTENS JEROEN JOHANNES SOPHIA MARIA;STREEFKERK BOB;VAN DER TOORN JAN GERARD CORNELIS;SMITS PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
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