发明名称 |
Phase-shifting test mask patterns for characterizing illumination polarization balance in image forming optical systems |
摘要 |
A method to monitor the state of polarization incident on a photomask in projection printing is presented. The method includes a series of phase-shifting mask patterns that take advantage of high NA effects to create a signal dependent on only one incident polarization component. The patterns include in two embodiments a Radial Phase Grating (RPG) and Proximity Effect Polarization Analyzers (PEPA). A test reticle design includes multiple polarimeters with an array of pinholes on the backside of the photomask. This technique is able to monitor any arbitrary illumination scheme for a particular tool.
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申请公布号 |
US7224458(B2) |
申请公布日期 |
2007.05.29 |
申请号 |
US20060357803 |
申请日期 |
2006.02.16 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
MCINTYRE GREGORY R.;NEUREUTHER ANDREW R. |
分类号 |
G01J4/00 |
主分类号 |
G01J4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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