发明名称 Charged particle beam column
摘要 The present invention provides a charged particle beam column that does not cause displacement of an image or degradation of a resolution of images when a charged particle beam is tilted at a large angle. In the charged particle beam column including an aberration corrector, a deflector is used to control the direction of incidence of the charged particle beam on a second condenser lens but the object point of a condenser lens is not shifted. Consequently, the converging charged particle beam is tilted at a large angle with respect to the surface of a specimen without the necessity of shifting the object point of an objective lens lying on the optical axis of the charged particle beam column. At this time, the aberration corrector prevents a shift of an image or degradation of a resolution derived from the tilt of the charged particle beam.
申请公布号 US7223983(B2) 申请公布日期 2007.05.29
申请号 US20050196256 申请日期 2005.08.04
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KAWASAKI TAKESHI;YOSHIDA TAKAHO;NAKANO TOMONORI
分类号 H01J3/14;H01J37/28 主分类号 H01J3/14
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