发明名称 |
GAS SHOWER, LITHOGRAPHIC APPARATUS AND USE OF A GAS SHOWER |
摘要 |
<p>A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.</p> |
申请公布号 |
SG131897(A1) |
申请公布日期 |
2007.05.28 |
申请号 |
SG20060073258 |
申请日期 |
2006.10.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN EMPEL, TJARKO ADRIAAN RUDOLF;VAN DER HAM, RONALD;ROSET, NIEK JACOBUS JOHANNES |
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