发明名称 GAS SHOWER, LITHOGRAPHIC APPARATUS AND USE OF A GAS SHOWER
摘要 <p>A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.</p>
申请公布号 SG131897(A1) 申请公布日期 2007.05.28
申请号 SG20060073258 申请日期 2006.10.19
申请人 ASML NETHERLANDS B.V. 发明人 VAN EMPEL, TJARKO ADRIAAN RUDOLF;VAN DER HAM, RONALD;ROSET, NIEK JACOBUS JOHANNES
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