| 摘要 |
PURPOSE:To improve a resolution without impairing heat resistance by incorporating a solvent essentially consisting of specific 3-octanone into the above resist. CONSTITUTION:The 3-octanone expressed by formula I is used as the solvent. The positive type resist compsn. contains a quinone diazide compd. and alkaline- soluble resin. While the amt. of the solvent to be used is not particularly limited as far as the coating to form the coating film of the uniform quality free from pinholes and unequal coating on a wafer is possible, the resist compsn. is usually prepd. to the concn. at which the solid content, i.e., a radiation sensitive compd. and resin are incorporated therein in a 3 to 50wt.% range; in addition, the ratio of the 3-octaone to the total solvent amt. is 50 to 100wt.%. The resist having the excellent heat resistance and resolution is obtd. in this way. |
