Method of making high density sputtering targets,申请号KR20000038786-传众专利搜索

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发明名称	Method of making high density sputtering targets
摘要
申请公布号	KR100721691(B1)	申请公布日期	2007.05.28
申请号	KR20000038786	申请日期	2000.07.07
申请人		发明人
分类号	H01L21/203;B22F3/15;C22C1/04;C22C1/05;C23C14/34	主分类号	H01L21/203
代理机构		代理人
主权项
地址

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