发明名称 POLISHING PAD
摘要 A transparent pad having a polishing surface with an average surface roughness of 5�m or less is used as a polishing pad. An indentation is formed on the back surface of the transparent pad such that its rate of light transmission is locally changed. The transparent pad has a rate of light transmission equal to or greater than 10% or preferably 30% for light of at least one wavelength in the range of 350nm-900nm.
申请公布号 KR100721888(B1) 申请公布日期 2007.05.28
申请号 KR20047020057 申请日期 2004.12.10
申请人 发明人
分类号 B24B37/00;H01L21/304;B24B37/04;B24B37/20;B24B37/24;B24B37/26 主分类号 B24B37/00
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