PROCESS FOR THE PREPARATION OF SINGLE CRYSTALLINE GALLIUM NITRIDE THICK LAYER,申请号KR20050111583-传众专利搜索

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发明名称	PROCESS FOR THE PREPARATION OF SINGLE CRYSTALLINE GALLIUM NITRIDE THICK LAYER
摘要
申请公布号	KR20070053855(A)	申请公布日期	2007.05.28
申请号	KR20050111583	申请日期	2005.11.22
申请人	SAMSUNG CORNING CO., LTD.	发明人	SHIN, HYUN MIN;LEE, CHANG HO
分类号	C30B29/38;C23C16/34;C30B25/10;H01L21/205	主分类号	C30B29/38
代理机构		代理人
主权项
地址

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