| 摘要 |
FIELD: polygraphy, possible use with template printing method. ^ SUBSTANCE: in accordance to method, adjustment and monitoring of tension evenness is performed by analysis of pattern, produced as a result of lighting of mesh base by laser. Interference pattern, received during passage of laser beam through mesh base of printing form, is analyzed. Analysis is performed by means of measuring the distance between central and one of neighboring maximums of radiation intensiveness on interference pattern before and after tensioning of mesh base. Mesh base tensioning process is performed until distance between radiation intensiveness maximums reaches the value determined from formula where Rt - distance between two radiation intensiveness maximums, central one and the one closest to it, measured after tensioning; R0 - distance between two radiation intensiveness maximums, central one and the one closest to it, measured before tensioning; K - coefficient for considering degree of stretching of mesh base material during tensioning and number of fabric characterizing number of threads in one centimeter of mesh base. ^ EFFECT: simplification of method, lower laboriousness of determining objective data about degree and evenness of tension of mesh base of template printing form. ^ 4 cl, 1 dwg |
